China CVD Furnace System-地铁文化之友俱乐部-中国地铁卡网

This is a small PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system. The equipment  consists of a 500W RF plasma generator, a open-type tube furnace that the  diameter is 50mm(with a vacuum flange and connecting pipe), and a direct connection double rotary mechanical pump. So this set of device models can be updated to different PECVD systems. This system is ideal for the material exploration under a limited budget.
1)Lower  temperature processing compared to conventional CVD.
2)Film  stress can be controlled by high/low frequency mixing techniques.
3)Control  over stoichiometry via process conditions.
4)Can do  a wide range of material deposition, including SiOx, SiNx, SiOxNy  and Amorphous silicon (a-Si:H) deposition.China CVD Furnace System
website:http://www.haoyueavp.com/tube-furnaces/cvd-furnace-system/

楼主(阅：3853/回：0)China CVD Furnace System